Process control in micro atmospheric pressure RF plasma jets by voltage waveform tailoring and customised boundary surfaces

DFG Projekt #417888799

From fundamentals to process control

Project C1 of SFB TR 87

Research Laboratory Microelectronics Bochum for 2D Electronics

Research on novel, flexible sensor systems based on two-dimensional material systems

The project „Electron heating in capacitive RF plasmas based on moments of the Boltzmann equation: From fundamental understanding to predictive control“ funded by the DFG started in June 2020. The project aims to fundamentally understand electron power absorption in capacitively coupled plasma sources (CCPs).

Capacitively coupled plasmas (CCPs) are widely used as surface etching, deposition and sputtering devices in the microelectronics industry due to their simple geometry and their ability to generate large area and radially uniform plasmas. Due to these important applications, a good insight into the plasma behavior in CCP discharges is highly desirable.