New paper published in J. Vac. Sci. Technol. A on “Effects of structured electrodes on electron power absorption and plasma uniformity in capacitive RF discharges” (DOI). In this work, we analyze the effects of trenches inside boundary surfaces on the electron power absorption dynamics in low pressure capacitive RF discharges based on GPU accelerated 2d3v PIC/MCC simulations. We find that the presence of trenches results in a local enhancement of the electron power absorption that depends on design details of the trench and the discharge conditions. Combining multiple trenches allows to improve the lateral plasma uniformity across large wafers.