Patterned Dielectric Barrier Discharges for environmental and biomedical applications
From fundamentals to process control
SFB 1316 – Project A4
Process control in micro atmospheric pressure RF plasma jets by voltage waveform tailoring and customised boundary surfaces
Plasma-based process control of reactive sputtering processes
DFG Projekt #417888799
Multifrequency Sputtering for the Deposition of Ceramic Layers
Project C1 of SFB TR 87
ForLab PICT2DES
Research Laboratory Microelectronics Bochum for 2D Electronics
FlexTMDSense
Research on novel, flexible sensor systems based on two-dimensional material systems
Electron heating in capacitive RF plasmas based on moments of the Boltzmann equation:
The project „Electron heating in capacitive RF plasmas based on moments of the Boltzmann equation: From fundamental understanding to predictive control“ funded by the DFG started in June 2020. The project aims to fundamentally understand electron power absorption in capacitively coupled plasma sources (CCPs).
2D Particle-in-Cell Simulations
Capacitively coupled plasmas (CCPs) are widely used as surface etching, deposition and sputtering devices in the microelectronics industry due to their simple geometry and their ability to generate large area and radially uniform plasmas. Due to these important applications, a good insight into the plasma behavior in CCP discharges is highly desirable.