SFB 1316 – Project A4

Process control in micro atmospheric pressure RF plasma jets by voltage waveform tailoring and customised boundary surfaces

ForLab PICT2DES

Research Laboratory Microelectronics Bochum for 2D Electronics

FlexTMDSense

Research on novel, flexible sensor systems based on two-dimensional material systems

2D Particle-in-Cell Simulations

Capacitively coupled plasmas (CCPs) are widely used as surface etching, deposition and sputtering devices in the microelectronics industry due to their simple geometry and their ability to generate large area and radially uniform plasmas. Due to these important applications, a good insight into the plasma behavior in CCP discharges is highly desirable.