From fundamentals to process control
Process control in micro atmospheric pressure RF plasma jets by voltage waveform tailoring and customised boundary surfaces
DFG Projekt #417888799
Project C1 of SFB TR 87
Research Laboratory Microelectronics Bochum for 2D Electronics
Research on novel, flexible sensor systems based on two-dimensional material systems
The project „Electron heating in capacitive RF plasmas based on moments of the Boltzmann equation: From fundamental understanding to predictive control“ funded by the DFG started in June 2020. The project aims to fundamentally understand electron power absorption in capacitively coupled plasma sources (CCPs).
Capacitively coupled plasmas (CCPs) are widely used as surface etching, deposition and sputtering devices in the microelectronics industry due to their simple geometry and their ability to generate large area and radially uniform plasmas. Due to these important applications, a good insight into the plasma behavior in CCP discharges is highly desirable.