New paper published

“Effects of structured electrodes on electron power absorption and plasma uniformity in capacitive RF discharges”

Li Wang earns Ph.D. in physics

Li Wang earns Ph.D. in physics from Dalian University of Technology. The title of her thesis is “Advanced PIC/MCC simulations of electron dynamics in capacitively coupled RF plasmas”. The thesis was supervised by Prof. Dr. Yuan-Hong Song and Prof. Dr. Julian Schulze.

SFB 1316 – Project A4

Process control in micro atmospheric pressure RF plasma jets by voltage waveform tailoring and customised boundary surfaces


Research Laboratory Microelectronics Bochum for 2D Electronics


Research on novel, flexible sensor systems based on two-dimensional material systems

2D Particle-in-Cell Simulations

Capacitively coupled plasmas (CCPs) are widely used as surface etching, deposition and sputtering devices in the microelectronics industry due to their simple geometry and their ability to generate large area and radially uniform plasmas. Due to these important applications, a good insight into the plasma behavior in CCP discharges is highly desirable.